Dassault Systèmes ENOVIA
The Fastest Track from Innovation to Rack™

About Dassault Systèmes ENOVIA:
Dassault Systèmes ENOVIA, a global leader in Product Lifecycle Management (PLM) solutions, enables top Apparel and Footwear brands to speed products to market by solving their most challenging new product development problems with collaborative, transparent and unified solutions. ENOVIA’s Apparel Accelerator™ for Design and Development and Apparel Accelerator™ for Sourcing and Production provide true visibility into the entire global supply chain from initial design through sourcing and manufacturing to retail. ENOVIA, a brand of Paris-based Dassault Systemes, is headquartered in Lowell, Massachusetts, USA, and has locations throughout the world. ENOVIA’s customer list includes Adidas, Gap, Gucci Group, GUESS, Haglöfs, Luxottica Group, Michael Kors, New Balance, Pacific Brands, Quiksilver, QVC, REI, Under Armour, Warnaco and more. ENOVIA, a brand of Paris-based Dassault Systemes, is headquartered in Lowell, Massachusetts, USA, and has locations throughout the world.

About Dassault Systèmes:
As a world leader in 3D and PLM solutions, Paris-based Dassault Systèmes brings value to more than 100,000 customers in 80 countries. A pioneer in the 3D software market since 1981, Dassault Systèmes develops and markets PLM application software and services that support industrial processes and provide a 3D vision of the entire lifecycle of products from conception to maintenance to recycling. The Dassault Systèmes portfolio consists of CATIA, SIMULIA, DELMIA, ENOVIA & 3DVIA. Visit us at www.3ds.com for more information.

Product Lifecycle Management for Retail, Footwear and Apparel
Dassault Systèmes ENOVIA enables Retail, Footwear and Apparel brands to dramatically accelerate innovation, time-to-market and revenue generation by collaboratively designing, developing, sourcing and producing products. Our solutions facilitate sharing of concepts, designs, content and context across product lifecycles and throughout value chains of employees, customers, suppliers and partners.

Our Apparel industry-specific solutions help global enterprises bring together people, processes, content and systems to achieve a compelling advantage. ENOVIA’s interoperable solutions unify and streamline processes across the product lifecycle, enabling companies to easily and cost-effectively work on projects and products within and outside of their enterprises. Our adaptable, scalable technology is built to accommodate the ever-changing Retail, Footwear and Apparel (RFA) marketplace.

The ENOVIA Apparel Accelerator™ for Design and Development enables companies to rapidly deploy a state of the art, scalable PLM solution to take products from trend to design to sourcing to customer. The solution comes complete with industry-specific best practices for apparel design including pre-defined work processes, data models, reports, role-based user interfaces and document management capabilities and supports processes for season and line planning, component and standards development, product design and development, sample management, vendor management and global sourcing. 

The ENOVIA Apparel Accelerator™ for Sourcing and Production is the apparel industry’s first integrated global development and sourcing solution that connects design and sourcing early in the process on a single, unified PLM platform. Brand and retail headquarters can seamlessly connect to global sourcing and production offices for optimized management, visibility and process control. The solution supports sourcing, costing, pre-production processes, and sample and test request management. The application creates, issues and manages Requests for Quotes (RFQ) allowing retailers and brands to effectively source, negotiate and manage product costs in an open and sealed bid process with their offices, agents and suppliers.

The ENOVIA Adobe® Illustrator® Integration is designed to create and access Matrix-managed data directly within the native Adobe interface, enabling design teams to manage data within PLM and share across the enterprise without disrupting the established team productivity. Organizations can collaborate more effectively and in parallel early on with the development processes instead of post-design completion. The native integration to Adobe Illustrator offers rapid adoption of the ENOVIA Apparel Accelerator for Design and Development by minimizing end-user training. The integration manages multiple views of data in a single file, securely distributes and controls product content, alerts product changes, and promotes established company standards by leveraging existing templates.